÷ 9 · 2012. 11. 8. · E-mail: [email protected] 1 % "¶KS354.7nm,G¡ áNe) ... + A± (852)...

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2012 9 5ISSN: 1817-6 917

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2 September 2012 www.laserfocusworld.com.cn Laser Focus World China

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2012 9 5www.laserfocusworld.com.cn

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September 2012 Issue 5www.laserfocusworld.com.cn

CONTENTSPhotonic Frontiers10 Quantum-Cascade Lasers: New designs expand capabilities of quantum-cascade lasers

Technologies Center13 Integrated Photonics: Integrated F-P laser array solves 100G problems

15 Semiconductor Lasers: Green laser diode emits at 536 nm

16 Terahertz Sources: Nanoantennas streamline photomixing terahertz source capabilities

19 Specialty Fiber:��

22 Fiber Optics:�� by means of simple optical exchange

24 Tunable Sources: Broadband OPO spans the mid-IR, no tuning needed

Imaging Inside26 Biomedical Imaging: ��

Applications28 Laser Cladding: The analysis of laser cladding remanufacturing technology in repairing rotating equipment

31 Biophotonics: !�� diagnosis

33 Diode Lasers: Applications of B2900A in the measurements of diode laser

7 News Breaks36 New Products40 Ad Index

Laser Focus World China, ISSN 1817-6917 is published bi-monthly by ACT International, Unit 1011, 10/F., New Kowloon Plaza, 38 Tai " �� #�" �� #�� " ��#�� $��%��& �� #��'��()�(�� #��#�*"�+'��)�& ��2010. All rights reserved. This publication contains article reprinted from Laser Focus World magazine. Laser Focus World is exclusively owned and published by PennWell Corporation. PennWell Corporation is not responsible in any way for the editorial policy and expressly �� #�� #��4�� #�� or reliability of products described herein that are products described by independent vendors.

About Laser Focus World ChinaLaunched in 2005, Laser Focus World China (LFWC) Bimonthly is the Chinese version of the world famous Laser Focus World magazine, which circulating controlled-free to average of 8,031 professionals in the laser and optoelectronic industry. Providing in-depth, timely information on current developments within the global laser and optoelectronic industry for our readers in China, LFWC selects some � � �� <=%�� >�� ?@�� &��)�$��>�� >��#��)laserfocusworld.com.cn.










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CO2

1 m

CorActive

20kHz

80ns 1W Q

2mJ 40W

M2

1.4

536nm

100mW

B2900A

/ China / Hong Kong SAR (852) 2838 6298 (852) 2838 2766 478 13 B Adonis Mak [email protected] Mark Mak [email protected] Michael Tsui [email protected] Rossie Pang [email protected]

(86) 755 2598 8571 (86) 755 2598 8567 [email protected]

In My View Jeffrey Bairstow [email protected] Industrial Lasers David A. Belforte (1) 508-347-9324 [email protected] Valerie Coffey (1) 978-263-4485 [email protected] Photonic Frontiers Jeff Hecht 617-965-3834 [email protected] Imaging Conard Holton (1) 603-891-9161 [email protected] Europe D. Jason Palmer (44) 7960 363308 [email protected]

Adrienne Adler Suzanne Heiser Chris Hipp Sheila Ward Steve Archer Debbie Bouley

Christine A. Shaw (1) 603-891-9178 [email protected] / Stephen G. Anderson (1) 603-891-9320 [email protected] John Wallace (1) 603-891-9228 [email protected] Gail Overton (1) 603-305-4756 [email protected] Carrie Meadows (1) 603-891-9382 [email protected] Katherine Mclntosh (1) 603-891-9224 [email protected]

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ISSN 1817-6917 2012









News Breaks

7 Laser Focus World China www.laserfocusworld.com.cn September 2012

Hanamura Optics2012 7

Hanamura Optics Hanamura

Optics

Hanamura

Optics

TornadoTornado Medical Systems

Tornado HTVS

HTVS

HTVS

IPGIPG

IPG Kubilay Yildirim

2010

9.2% 2011 8.5%

2011 GDP

16 5

Z

1

30 Z

Oclaro OpnextOclaro Opnext Oclaro

Oclaro

Oclaro

2011 40G 100G

5

20128 21

2012

1500









News Breaks


SIM2Multimedia

CO

CO

USB2.0

5 30

10 10

40.4

OIFA

HR2000 LIBS

NASA 2011 11 HR2000

LIBS

HR2000

2000

2000

4

3000

2000









Photonic Frontiers


Jeff Hecht

2012 5 CLEO

Jérôme Faist

QCL 1994

[1]

10mW

Jérôme Faist

20%

IR

R.F. Kazarinov R.A. Suris 1971

[2]

Faist

20-

200

20%

3~300μm

10%

Faist

[3]

2009 Pranalytica

DARPA

3W 4.6μm

1 Daylight Solutions 3~20μm100mW









Photonic Frontiers


0.86kA/cm2

12.7% [4]

Manijeh

Razeghi

4.9μm 5.1W

5mm

8μm

21%

27% [5]

400μm

4.4μm

120W 200ns

0.2% [6] 2

Daylight Solutions

Erik Takeuchi

4~5μm

2W

6μm

8μm 1.5W

80%

2010

Razeghi

5μm

40K 53%

[7]

4μm

2012 CLEO

Dundee

3.2μm 85nm [8]

Faist

3.3μm

450nm [9,10]

3~4μm ICL

3

2011

Jerry Meyer

170A/cm2

13.5% [11]

Meyer

CLEO

6μm

5.6μm

190 K

9.4μm [12]

CLEO

166 K

10.3μm

125 K

9.0μm 150 K[13]

0.3ps

CLEO Faist

2

(μm)

(W)

12108642

10

1

0.1

0.01

T = 298 K









Photonic Frontiers


CLEO Faist Andreas Hugi

7μm 490nm

10Hz [14]

Takeuchi

14~16μm

Takeuchi

Takeuchi Daylight

100 5.5

1. J. Faist et al., Quantum cascade laser, Science, 264, 553–

556 (April 1994).

2. R.F. Kazarinov and R.A. Suris, Possibility of ampli�cation

of electromagnetic waves in a semiconductor with a

superlattice, Fiz. Tekh. Poluprov., 5, 797–800 (1971); transl.

in Sov. Phys. Semicond., 5, 707–709 (1971).

3. R. Terazzi and J. Faist, New J. Phys., 12, 033045 (2010).

4. A. Lyakh et al., 3 W continuous-wave room temperature

single-facet emission from quantum cascade lasers based on

nonresonant extraction design approach, Appl. Phys Lett.,

95, 14, 141113 (2009).

5. Y. Bai et al., Room temperature quantum cascade lasers with

27% wall-plug ef�ciency, Appl. Phys. Lett., 98, 181102 (2011).

6. Y. Bai et al., High power broad area quantum cascade

lasers, Appl. Phys. Lett., 95, 221104 (2009).

7. Y. Bai et al., Quantum cascade lasers that emit more light

than heat, Nat. Photon., 4, 99 (February 2010).

8. T. Kruczek et al . , 3190–3275 nm tuneable, room

temperature, external cavity InAs/AlSb Quantum Cascade

Laser, CLEO Tech. Dig., paper CF1K.6 (2012).

9. A. Bismuto et al., Sb-free quantum cascade lasers in the

3–4 _m spectral range, Semicon. Sci. Technol., 27, 045013

(2012); doi:10.1088/0268-1242/27/4/045013.

10. S. Riedi et al., EC tuning of broadband QCL active region

designs around 3.3 _m and 8 _m, CLEO Tech. Dig., paper

CF1K.2(2012).

11. I. Vurgaftman et al., Rebalancing of internally generated

carriers for mid-infrared interband cascade lasers with very

low power consumption, Nat. Commun., 2, 585 (Dec. 13,

2011); doi:10.1038/ncomms1595.

12. C.L. Canedy et al., Improved interband cascade lasers for

LAMBDA=3-5.6 μm, CLEO Tech. Dig., paper CF1K.3 (2012).

13. L. Li et al., Interband cascade lasers at long wavelengths,

CLEO Tech. Dig., paper CF3K.2 (2012).

14. A. Hugi et al., Mid-IR broadband quantum-cascade laser

frequency comb, CLEO Tech. Dig., paper CTh3N.3 (2012).

a)

b)

c)

(light)e-

p+

p+ e-

e-

e-

e-

e-

p+ e-

p+ e-

3 a b

-

p









Technologies Center


F-P 100Gbit/s

23

100G

VCSEL

1~10Gbit/s

100G OM3 /

50 m/125 m VCSEL

100m

Kotura Arlon Martin

10km 100GBase LR 100Gbit/s

IEEE 802.3

DFB

EA WDM

10G 100

Martin

20~24W 10G

1~2W 100G C CFP

iPhone 19

100G

10G

Martin 100G

800GHz 1300nm

4.5nm

1295.56nm 1300.05 1304.58nm

1309.14nm

4.5nm 2.1nm

25GHz

F-P

F-P

10,000 F-P

InP F-P

Kotura

F-P WDM

Kotura

1

WDM

InP

1 12

Gail Overton









Technologies Center


536nmJeff Hecht

18

InGaN

532nm Nd YAG

Sumitomo

Electric 527nm

532nm

100mW

536.6nm

50mW

4.5 [1]

530~535nm

515~520nm

10nm

C

M

C 45

GaN InGaN

100mW

2_m 500_m

525.1nm

532.1nm 535.7nm

167mW 107mW 75mW

536.6nm

50mW

525~532nm 7.0

~8.9

6.4

555nm

540nm 570 nm

CIE

523nm

530~535nm

30 520~530nm

InGaN

C

CIE 523nm550nm

1931 CIE0.0

0.1

0.2

0.3

0.4

0.5

0.6

0.7

0.8

520

540

0.9

0.0 0.1 0.2 0.3 0.4 0.5 0.6 0.7 0.

y

x

560

580

600

620

700

380460470

480

490

500









Technologies Center


Hendrix Tanato Jing Hua Teng Stefan A. Maier

CW

A*STAR

IR

20

[1]

[2]

QCL MQW

- [5]

1.8THz 163K

Auston

[3]

A

B

1

FTIR









Technologies Center


[6]

1.1THz

100nW [7]

[8]

[9]

1

- -

100nm[10] LT

GaAs

2

100nm

300nm

FTIR

2 SEM a

b

3 1THz ab

（THz）

（��）

a)

b)

1.6

102

（a.u.）

105

341 μm

255μm

2 μm2 μm

100 μm

100μm

101

100

10-1

10-2

104

103

102

1.41.21.00.80.60.40.2

5 μm

5 μm

a)

b)

1-μm LT-GaAs

10.0V/m

y

xzZ = 0

350-μm SI-GaAs (εr = 12.9)

E0 = 1 V/m

e

h

e

hE0 = 1 V/m

8.126.855.764.824.013.312.712.191.751.371.040.750.510.300.12

0









Technologies Center


1.3THz

FDTD Computer

Simulation Technology CST CST Microwave

Studio 1THz

3

1V/m

y

100

x

COMSOL COMSOL

Multiphysics

1/3

RC

1. E.D. Palik, J. Opt. Soc. Am., 67, 7, 857-865 (1977).

2. M. Tonouchi, Nat. Photon., 1, 97-105 (2007).

3. X.C. Zhang et al., J. Appl. Phys., 71, 326-338 (1992).

4. C. Jansen et al., Appl. Optics, 49, E48 (2010).

5. B.S. Williams, Nat. Photon., 1, 517-525 (2007).

6. S.Kumar et al., Nat. Phys., 7, 166-171 (2011).

7. M. Feiginov et al., Appl. Phys. Lett., 99, 233506 (2011).

8. E.R. Brown et al., Appl. Phys. Lett., 66, 285-287 (1995).

9. H. Tao et al., IEEE J. Select. Topics Quantum Electron., 17,

92-101 (2011).

10. H. Tanoto et al., Nat. Photon., 6, 121-126 (2012).

Hendrix Tanoto A*STAR

Jing Hua Teng

Stefan A. Maier

15

V 4.7 V

80 528.1nm

90mW

527~530nm InGaN[2] 1000

50mW

5000 70mW

2000

1. S. Takagi et al., Appl. Phys. Expr., 5, 082102 (2012).

2. K. Yanashima et al., Appl. Phys. Expr., 5, 082103 (2012).









Technologies Center


Michel Begin Bertrand Morasse CorActive

CO2

1 m

1 m

DCOF

0.9~1.0 m

40W 2mJ

SRS

SPM [1]

MOPA

SBS









Technologies Center


>50 J

h c0 0

A

e a

[2-6]

1.06 m 1 20 m

0.15mJ

0.15mJ

20 m

0.35mJ

FA

/

1

CorActive DCF-YB-30/250P-FA

1 CorActive FA

1 a 30 m 20kHz 80ns 1W Q 2mJ 40Wb 17kW 915nm 73% c

(μm) (μm)

(NA)

@ 915 nm (dB/m)

DCF-YB-7/128-FHA 7 128 0.19 1.3

DCF-YB-15/28P-FA 15 128 0.13 5.5

(10 W/0.5 mJ)

DCF-YB-20/128P-FA 20 128 0.11 9

(20–30 W/1 mJ)

DCF-YB-30/250P-FA 30 250 0.11 5.5

(30–40 W/1–2 mJ)

DCF-YB-50/400P-FA 50 400 0.11 4.5

(>40 W, >2 mJ)

1W Q

a) b) 1064 nm (W)

915 nm (W)

DCF-YB-30/250P-FA 40

30

20

10

00 20 40

= 73%

60 80

c) (dB)

(nm)

-30

-40

-50

-60

-70

900 950 1000 115011001050 1200









Technologies Center


2

3 CorActive DCF-YB-30/250P-FAM2<1.4

20kHz 80ns

1W Q 2mJ 40W

1

17kW 40kW

30 m

915nm

73%

1 40W/2mJ

NA 0.20

2 [7,8]

<0.1 dB

0.10 0.06

LMA

M2 1.4

3

1. G.P. Agrawal, Nonlinear Fiber Optics, Academic Press, San

Diego, CA (2001).

2. K.T. Vu et al., Opt. Exp., 14, 23, 10996–11001 (2006).

3. D.N. Schimpf et al., Opt. Exp., 16, 22, 17637–17646 (2008).

4. M.N. Zervas et al., "High peak power, high rep-rate pulsed

fibre laser for marking applications," Proc. SPIE, 6102,

61020Q-1 (2006).

5. F. He et al., Opt. Exp., 14, 26, 12846–12858 (2006).

6. A.E. Siegman, Lasers, University Science Books, Sausalito, CA

(1986).

7. P. Laperle et al., "Yb-Doped LMA Triple-Clad Fiber Laser,"

Proc. SPIE, 6343, 63430X-1 (2006).

8. P. Laperle et al., "Yb-Doped LMA Triple-Clad Fiber for Power

Ampli�ers," Proc. SPIE, 6453, 645308-1 (2007).

(mm)

1400

1200

1000

800

600

400

2000250 350 450

M2 <1.4

550

(μm)

A2 A1I









Technologies Center


Wolfgang Anderschs Rudolf Huber Daniel Mock

TruLaser Cell

7040

LLC

LLC

LLC

200 m

200 m

LLC

600

100 μm

n n1 n2

1

LLC

LLC









Technologies Center


13

1

2

100 m 600 m

3

2

3

4 WDM 12 40

Kotura 3 m

25GHz

25G

100G

Kotura WDM 100G

10

4.4Tbit/s

2km CFP









Technologies Center


M1 PZT

PD1M1

M3 OP-GaAs M2

M4

PZT

90 fs at2050 nm

OPO

Nick Leindecker Konstantin Vodopyanov

OPO

OPO

OPO

OPO

QCL

OPO

OPO

OPO OPO

OPO OPO

[1]OPO

10mW

1 OPO 600mW -75 MHz 93fs M1 OPO

50mm 0.5mmOP-GaAs PZT YAG OC

Fresnel

OPO[2]

PPLN

OP-GaAs

1.5 m 2.05 m

Cr ZnSe 2.45 m

[3-5]

1 IMRA

America -

2.05 m

600mW









Technologies Center


2

10-4

(μm)

(a.u.)

3 4 5 6

10-3

10-2

10-1

10-0T = 0

T = 1

T ( )

（μm）

(T )

3.20 3.25

101

100

10-13.30 3.35 3.40 3.45

75MHz 93fs OPO

4

M1

3~6 m

OP-GaAs0.5mm QPM OP-GaAs

4.1 m BAE

Systems

QPM 1mm

1mm 4mm QPM 60.5 m

0.5mm 8

73

GaAs <111> 4.1 m

GVD d2k/d 2 YAG

CaF2

GaAs

OPO

20mW

600mW

20

2.6~6.1 m

2

40mW

CO2

OPO

OPO

3 3.3 m

OPO

GaAs OPO 2.6~6.1 m

OH CH CO

NH

OPO /

1.F. Keilmann et al., Opt. Lett., 29, 1542 (2004).

2. A. Marandi et al., Opt. Expr., 20, 7255 (2012).

3. N. Leindecker et al., Opt. Expr., 19, 6296 (2011).

4. N. Leindecker et al., Opt. Expr., 20, 7047 (2012).

5. K. L. Vodopyanov et al., Opt. Lett., 36, 2275 (2011).

2 OPO2.6~6.1 m 4.25 m

CO2

3 3.3 m 10ppmSmithsonian Astrophysical

Observatory HITRAN









Imaging Inside


Jeff Hecht

Hui Cao

LED

Michael Choma

OCT

Brandon

1 a b

Redding

240nm

532nm

[1]

[2]

LED

LED

Choma









Imaging Inside

Chris Dainty

Joseph

Goodman

Goodman

[3]

1. B. Redding et al., Opt. Lett., 36, 3404

(Sept. 1, 2011).

2. B. Redding et al., Nat. Photon. (advance

online publication, (Apr. 29, 2012);

doi:10.1038/NPHOTON.2012.90.

3. J. Manni and J. Goodman, Opt. Exp.,

20, 11288 (2012).

illumia®lite

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应用天地

28 September 2012 www.laserfocusworld.com.cn Laser Focus World China 激光世界

激光熔覆技术修复转动设备的分析与应用李永波，于恩洪，刘书宏；沈阳新松机器人自动化股份有限公司

激光熔覆技术是利用高能密度的激光束，瞬间将被加

工件表面微熔，同时使预置于零件表面或与激光束

同步送入的合金粉末完全熔化，获得与基体冶金结合的致

密覆层。该技术是最近 10 年内发展起来的应用于工业领

域中高温、高压、高转速转动设备修复的一项全新技术，

已先后赢得了石化、电力、冶金等十几个行业的认可与青

睐。截至 2011 年底，已开发的利用激光熔覆再制造技术

修复的市场规模已经接近 30 亿元。但另一方面，利用激

光熔覆再制造技术进行工业产品维修、再造的激光应用厂

商尚不足以满足当前市场的需求，特别是工业转动设备修

复市场，仍然存在着大量市场空间等待新厂商的开发进入。

激光熔覆再制造技术的特点

激光熔覆再制造是以丧失使用价值的损伤、废旧零部

件作为再制造毛坯，利用以激光熔覆技术为主的高新技术

对其进行批量化修复再生、性能升级，所获得的激光再制

造产品在技术指标、使用性能和质量方面均能达到甚至超

过新产品的水平。

其主要特点有：

1、激光熔覆层与基体为冶金结合，结合强度不低于原

基体材料的 90%。

2、基体材料在激光加工过程中仅表面微熔，微

熔层厚度为 0.05~0.1mm。基体热影响区极小，一般为

0.05~0.2mm。

3、激光加工过程中基体温升不超过 80℃，激光加工

后基本无热变形。

4、熔覆层与基体均无粗大的铸造组织，熔覆层及其

界面组织致密，晶体细小，无孔洞、夹杂、裂纹等缺陷。

5、激光熔覆层可根据具体工件的技术要求，实现梯

度功能熔覆材料的选择。

6、激光熔覆再制造技术可控性好，易于实现自动化控制。

激光熔覆

图1：典型的激光熔覆再制造金相组织照片。

熔覆层

过渡区

热影响区

基材

图 1 为一张典型的激光熔覆再制造金相组织照片，

从中可以清晰地看出激光熔覆层金相组织的四个区域，

分别为：

（1）最底层为基材：灰色区域，激光熔覆再制造的

基材基本包括了所有金属材料，工业领域最常用的为黑

色金属；

（2）第二层为热影响区：深灰色区域，化学成份与基

材相同，在激光熔覆过程中基体组织因受热发生金相变化。

原则上热影响区控制的越小越好。热影响区与基材的分界

线不是很清晰，但与过渡区的分界线却十分清晰。

（3）第三层为过渡区：浅灰色区域，化学成份受基材

与熔覆材料的双重影响，组织结构最为复杂，金相组织很

难显现出来，与热影响区和熔覆层的分界线都非常明显（下

层黑线，上层亮线）。

（4）第四层（最上层）为熔覆层：仍为浅灰色区域，

但可清晰地看出熔覆层中的枝晶结构。基化学成份完全为

熔覆材料形成的快速凝固铸态组织，特点为组织细密、晶

粒细小，枝晶生长具有明显的方向性。

工业领域转动设备现状分析

工业透平机械（又叫涡轮转动设备）是目前世界工









业领域范围通用的能

量转换或能量回收装

置，是工业企业生产

线正常运转的核心，

也可以称为国家经济

命脉的核心。机组类

型包括压缩机、风机、

汽轮机、TRT，烟气

轮机、地面燃机等。

根据机组大小的不

同，国产机组每台套

价在 100 万到几百万

元之间，进口机组每

台套价在几百万到几

千万元之间。在使用

过程中，透平机械的

转动部分如主轴颈、

汽封颈、推力盘推力

面、轮盘 / 流道 / 叶

片及键槽位，静止部分如缸体内壁、缸体中分面都是易损部位。在激光熔

覆 / 再制造技术产生之前，该类转子的维修方法主要集中在返厂更换损伤部

件。而这样的维修方法不但周期长，价格高（尤其进口设备），而且更换下

来的损坏部件无法再次利用，造成资源的极大浪费。而利用激光熔覆再制

造技术，将透平机械的损伤部位进行局部修复，则在工期、成本方面比返

厂维修节省一倍到十几倍、甚至几十倍，且维修后的产品质量达到或超过

原厂设计要求。同时，对于一台机组的同一损伤部位可进行多次修复，这

就在资源利用方面体现出更大的优势，社会价值难以估量。

上世纪 80 年代以前，国有工业企业的重大转动设备主要依靠进口。本世

纪，很多国有支柱性产业的重要转动设备都实行国产化改造，并投入到国有

经济运行体系中。随着国家经济的高速发展，在役的转动设备数量十分庞大。

仅以我国火力发电厂汽轮机为例，国内各级电厂拥有各种不同规格型号的汽

轮机组几千台，且每台汽轮机必匹配一台发电机。在我国，仅 100MW 以上

的发电机组就超过 1500 台。而发电机组中汽轮机的动静叶片、静叶环、隔板（喷

咀）、主轴颈、气封颈、推力盘、围带、铆钉及汽机缸体等部件的损伤，都具

有周期性的特点。目前，很多电厂已经采用激光熔覆再制造技术维修这些部件。

在冶金行业，利用激光再制造技术修复钢厂的转动部件、易损部件及重

载部件，已经被越来越多的钢铁企业认可并使用，无论是钢厂第一大宗消耗

品——轧辊的激光强化再制造、能量回收与转换装置 TRT 机组各部件的激光

熔覆再制造，还是热轧机牌坊的现场修复技术，都为企业带来了巨大的经济

利益和直接效益。

图3：某电厂300MW汽轮机铆钉激光再制造。

应用天地

图2：某石化公司压缩机转子汽封轴颈激光熔覆。










应用天地

30 September 2012 www.laserfocusworld.com.cn Laser Focus World China 激光世界

由于涡轮转动设备具有“周期性维修”的特点，促

使企业必须不断寻找更合理、更可靠、更快捷的技术来

解决转动设备的修复。激光熔覆技术凭借着不可替代的

技术优势，首当其冲地成为了国有工业企业修复转动设

备的首选。

激光再制造通用工艺流程如下：

产品入厂检测——部件分解——强度计算及寿命评

估 / 无损检测——损伤部位清理——着色探伤检测——损

伤部位激光熔覆再制造——损伤部位机械加工复形——机

加后检测（包括尺寸、无损等）——表面涂层处理（若需

要的话）——检测——机组回装——动平衡检测——总检

测——包装出厂

激光熔覆再制造的八大关键技术

•强度计算与寿命评估技术

•无损检测与缺陷判断技术

•故障诊断与失效分析技术

•激光熔覆专用材料制造技术

•激光加工工艺技术

•梯度功能材料技术

•机组改造与制造技术

•激光再制造涡轮动力设备企业标准

激光熔覆再制造应用案例

案例一：石化行业压缩机转子轴颈激光再制造（见图 2）

选用设备：5000W 横流 CO2 激光器

维修部位：第二级叶轮汽封颈

熔覆方式：重力送粉，螺旋式进给编程熔覆

工艺参数：功率：2500~3500W ；

扫描速度：300~600mm/min ；光斑尺寸：φ4mm ；

熔覆厚度：1mm ；搭接率：40% ；

熔覆材料：一种铁基双向不锈钢超合金粉，熔覆后硬度：

HRC35-40

案例二：电力行业汽轮机叶片围带上铆钉的现场激光

再制造（见图 3）

作业方式：电厂现场作业

选用设备：2000W 全固态光纤输出激光器

维修部位：末级叶片围带铆钉

熔覆方式：侧向送粉，方型块编程熔覆

工艺参数：功率：1500~1800W ；

扫描速度：450mm/min ；

光斑尺寸：φ2.5mm ；

熔覆厚度：0.8mm ；搭接率：40% ；

熔覆材料：一种适合 600℃工况的镍基高温合金粉，

熔覆后硬度：HRC25-28。

案例三：冶金行业轧辊激光强化再制造（见图 4）

作业方式：钢厂现场作业

选用设备：5000W 横流 CO2 激光器

强化位置：轧辊工作面

强化方式：预置涂层，螺旋式编程熔覆

工艺参数：功率：4000~4500 W ；

扫描速度：1000~1200mm/min；

光斑尺寸： φ1.8mm；

强化深度：0.8~1.2mm ；

搭接率：30% ；

涂层材料：Al2O3、TiC 等多种硬质相混合，

强化后硬度：HRC55-62

结束语

利用激光熔覆再制造技术修复工业领域的转动设备，

已逐渐赢得了国内众多企业的青睐与好评，同时该项技术

也受到了国家各部委及各地方政府的高度重视。激光熔覆

再制造技术在石化、电力、冶金三大主导工业领域中已经

得到很好的应用，并且创造出了可观的经济效益和社会效

益。但是，由于该项技术在市场上的推广仅有大约十年的

时间，因此其在军工、机械、矿山、船舶等行业的应用还

需要更多的激光再制造厂商共同努力开发。

图4：某钢厂大型型材轧辊激光强化再制造。










Taewoo Kim Shamira Sridharan Gabriel Popescu

[1]

DIC[2]

QPI

[3]

[4-6]

QPI

GFM [9]GFM

GFM

GFM

4f

SLIM[7]

SLIM Zernike

Gabor

0.3nm

0.03nm[8] 40X/0.65

NA

HGPIN

1

1 100 10 10

HGPIN










GFM

GFMGFM

GFM

DIC

DIC

GFM

DIC 2 GFM

DIC

GFM

HGPIN

3 [10] HGPIN[11]

34BE12

p63 GFM

GFM

1. Editorial, Milestones in light microscopy, Nature Cell Biol.,

11, 1165 (2009).

2. M. Pluta, Advanced light microscopy, Polish Scientific

Publishers, Warsaw, Poland (1988).

3. G. Popescu, Quantitative phase imaging of cells and tissues,

McGraw Hill, New York, NY (2011).

4. Y.K. Park et al., Proc. Natl. Acad. Sci., 107, 15, 6731–6736

(2010).

5. H.F. Ding et al., Phys. Rev. Lett., 101, 23, 238102 (2008).

6. M. Mir et al., Proc. Natl. Acad. Sci. 108, 32, 13124–13129

(2011).

7. Z. Wang et al., J. Biomed. Opt., 16, 11, 116017 (2011).

8. Z. Wang et al., Opt. Exp., 19, 2, 1016–1026 (2011).

9. T. Kim, S. Sridharan, and G. Popescu, Opt. Exp., 20, 6, 6737–

6745 (2012).

10. J.I. Epstein and G.J. Netto, Biopsy Interpretation of the

Prostate, Lippincott Williams & Wilkins, Philadelphia, PA

(2007).

11. J.I. Epstein and M. Herawi, J. Urol., 175, 820–834 (2006).

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3 GFM a 1 100X/1.4 NA 225 15 15

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